“Wallpaper pattern alignment along garment seams” by Wolff and Sorkine-Hornung

  • ©Katja Wolff and Olga Sorkine-Hornung




    Wallpaper pattern alignment along garment seams

Session/Category Title:   Textiles and Fabrication



    Despite recent developments towards on-demand, individualized garment design and fabrication, the majority of processes in the fashion industry are still inefficient and heavily dependent on manual work. A significant amount of recent research in this area has been focused on supporting designers to digitally create sewing patterns and shapes, but there is little work on textured fabrics. Aligning textile patterns like stripes or plaid along garment seams requires an experienced tailor and is thus reserved only for expensive, high-end garments. We present an interactive algorithm for automatically aligning repetitive textile patterns along seams for a given garment, allowing a user to make design choices at each step of our pipeline. Our approach is based on the 17 wallpaper groups and the symmetries they exhibit. We exploit these symmetries to optimize the alignment of the sewing pattern with the textured fabric for each of its pieces, determining where to cut the fabric. We optionally alter the sewing pattern slightly for a perfect fit along seams, without visibly changing the 3D shape of the garment. The pieces can then be cut automatically by a CNC or laser cutter. Our approach fits within the pipeline of digital garment design, eliminating the difficult, manual step of aligning and cutting the garment pieces by hand.


    1. Noam Aigerman, Roi Poranne, and Yaron Lipman. 2015. Seamless surface mappings. ACM Trans. Graph. 34, 4 (2015), 72. Google ScholarDigital Library
    2. Aric Bartle, Alla Sheffer, Vladimir G Kim, Danny M Kaufman, Nicholas Vining, and Floraine Berthouzoz. 2016. Physics-driven pattern adjustment for direct 3D garment editing. ACM Trans. Graph. 35, 4 (2016). Google ScholarDigital Library
    3. Floraine Berthouzoz, Akash Garg, Danny M Kaufman, Eitan Grinspun, and Maneesh Agrawala. 2013. Parsing sewing patterns into 3D garments. ACM Trans. Graph. 32, 4 (2013). Google ScholarDigital Library
    4. Remi Brouet, Alla Sheffer, Laurence Boissieux, and Marie-Paule Cani. 2012. Design preserving garment transfer. ACM Trans. Graph. 31, 4 (2012), Article-No. Google ScholarDigital Library
    5. CLO. 2018. clo3d.com. https://www.clo3d.com.Google Scholar
    6. Philippe Decaudin, Dan Julius, Jamie Wither, Laurence Boissieux, Alla Sheffer, and Marie-Paule Cani. 2006. Virtual garments: A fully geometric approach for clothing design. Comput. Graph. Forum 25, 3 (2006), 625–634.Google ScholarCross Ref
    7. CG Elves. 2019. Marvelous Designer Garments Library. https://cgelves.com/shop/marvelous-designer-garments-library-incl-patterns-fabric-presets/.Google Scholar
    8. ES Fedorov. 1891. Symmetry in the plane. Zapiski Imperatorskogo S. Peterburgskogo Mineralogicheskogo Obshchestva {Proc. S. Peterb. Mineral. Soc.} 2, 28 (1891), 345–390.Google Scholar
    9. Yuki Igarashi, Takeo Igarashi, and Hiromasa Suzuki. 2008. Automatically adding seam allowance to cloth pattern. In ACM SIGGRAPH 2008 posters. ACM, 15. Google ScholarDigital Library
    10. Wenzel Jakob, Marco Tarini, Daniele Panozzo, and Olga Sorkine-Hornung. 2015. Instant Field-Aligned Meshes. ACM Trans. Graph. 34, 6 (Nov. 2015). Google ScholarDigital Library
    11. Michael Keckeisen, Matthias Feurer, and Markus Wacker. 2004. Tailor tools for interactive design of clothing in virtual environments. In Proceedings of the ACM symposium on Virtual reality software and technology. ACM, 182–185. Google ScholarDigital Library
    12. Tsz-Ho Kwok, Yan-Qiu Zhang, Charlie CL Wang, Yong-Jin Liu, and Kai Tang. 2016. Styling evolution for tight-fitting garments. IEEE Trans. Vis. Comput. Graph. 22, 5 (2016), 1580–1591. Google ScholarDigital Library
    13. Minchen Li, Alla Sheffer, Eitan Grinspun, and Nicholas Vining. 2018. FoldSketch: Enriching Garments with Physically Reproducible Folds. ACM Trans. Graph. 37, 4 (2018). Google ScholarDigital Library
    14. Yanxi Liu, Robert T Collins, Yanghai Tsin, et al. 2004. A computational model for periodic pattern perception based on frieze and wallpaper groups. IEEE Transactions on Pattern Analysis & Machine Intelligence 26, 3 (2004), 354–371. Google ScholarDigital Library
    15. Yanxi Liu, Hagit Hel-Or, Craig S Kaplan, Luc Van Gool, et al. 2010. Computational symmetry in computer vision and computer graphics. Foundations and Trends® in Computer Graphics and Vision 5, 1–2 (2010), 1–195.Google Scholar
    16. Shufang Lu, PY Mok, and Xiaogang Jin. 2017. A new design concept: 3D to 2D textile pattern design for garments. Computer-Aided Design 89 (2017), 35–49. Google ScholarDigital Library
    17. Niloy J Mitra, Mark Pauly, Michael Wand, and Duygu Ceylan. 2013. Symmetry in 3D geometry: Extraction and applications. Comput. Graph. Forum 32, 6 (2013), 1–23. Google ScholarDigital Library
    18. Patrick Mullen, Yiying Tong, Pierre Alliez, and Mathieu Desbrun. 2008. Spectral conformal parameterization. Comput. Graph. Forum 27, 5 (2008), 1487–1494. Google ScholarDigital Library
    19. Rajkishore Nayak and Rajiv Padhye. 2017. Automation in Garment Manufacturing. Woodhead Publishing.Google Scholar
    20. Jorge Nocedal. 1980. Updating quasi-Newton matrices with limited storage. Mathematics of computation 35, 151 (1980), 773–782.Google Scholar
    21. C. Robson, R. Maharik, A. Sheffer, and N. Carr. 2011. Context-Aware Garment Modeling from Sketches. Computers & Graphics (Proc. SMI 2011) 35, 3 (2011), 604–613. Google ScholarDigital Library
    22. Kenneth Rose, Alla Sheffer, Jamie Wither, Marie-Paule Cani, and Boris Thibert. 2007. Developable surfaces from arbitrary sketched boundaries. In Proc. Symposium on Geometry Processing. Eurographics Association, 163–172. Google ScholarDigital Library
    23. Christian Schüller, Ladislav Kavan, Daniele Panozzo, and Olga Sorkine-Hornung. 2013. Locally Injective Mappings. Comput. Graph. Forum 32, 5 (2013), 125–135. Google ScholarDigital Library
    24. Olga Sorkine-Hornung and Michael Rabinovich. 2016. Least-squares rigid motion using SVD. Technical note.Google Scholar
    25. Emmanuel Turquin, Jamie Wither, Laurence Boissieux, Marie-Paule Cani, and John F Hughes. 2007. A sketch-based interface for clothing virtual characters. IEEE Computer Graphics and Applications 27, 1 (2007). Google ScholarDigital Library
    26. Christopher W Tyler. 2003. Human symmetry perception and its computational analysis. Psychology Press.Google Scholar
    27. Nobuyuki Umetani, Danny M Kaufman, Takeo Igarashi, and Eitan Grinspun. 2011. Sensitive couture for interactive garment modeling and editing. ACM Trans. Graph. 30, 4 (2011), 90–1. Google ScholarDigital Library
    28. Amir Vaxman, Marcel Campen, Olga Diamanti, Daniele Panozzo, David Bommes, Klaus Hildebrandt, and Mirela Ben-Chen. 2016. Directional field synthesis, design, and processing. Comput. Graph. Forum 35, 2 (2016), 545–572.Google ScholarCross Ref
    29. Pascal Volino, Frederic Cordier, and Nadia Magnenat-Thalmann. 2005. From early virtual garment simulation to interactive fashion design. Computer Aided Design 37, 6 (2005), 593–608. Google ScholarDigital Library
    30. Martin Franz Stephan von Gagern. 2008. Computergestütztes Zeichnen in den Symmetriegruppen der euklidischen Ebene. Master’s thesis. TU Munich.Google Scholar
    31. Tuanfeng Y. Wang, Duygu Ceylan, Jovan Popovic, and Niloy J. Mitra. 2018. Learning a Shared Shape Space for Multimodal Garment Design. ACM Trans. Graph. 37, 6 (2018), 1:1–1:14. Google ScholarDigital Library
    32. Amy Wibowo, Daisuke Sakamoto, Jun Mitani, and Takeo Igarashi. 2012. DressUp: a 3D interface for clothing design with a physical mannequin. In Proceedings of the Sixth International Conference on Tangible, Embedded and Embodied Interaction. ACM, 99–102. Google ScholarDigital Library
    33. Stephen Wright and Jorge Nocedal. 1999. Numerical optimization. Springer Science.Google Scholar
    34. Eugene Zhang and Greg Turk. 2002. Visibility-guided Simplification. In Proceedings of the Conference on Visualization ’02 (VIS ’02). IEEE Computer Society, Washington, DC, USA, 267–274. http://dl.acm.org/citation.cfm?id=602099.602140 Google ScholarDigital Library

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