“Improved Linear Light Source material reflectance scanning” by Meseth, Hempel, Weidlich, Fyffe, Fyffe, et al. …

  • ©Jan Meseth, Shawn Hempel, Andrea Weidlich, Lynn Fyffe, Graham Fyffe, Craig Miller, Paul Carroll, and Paul E. Debevec




    Improved Linear Light Source material reflectance scanning



    We improve the resolution, accuracy, and efficiency of Linear Light Source (LLS) Reflectometry with several acquisition setup and data processing improvements, allowing spatially-varying reflectance parameters of complex materials to be recorded with unprecedented accuracy and efficiency.


    1. Gardner, A., Tchou, C., Hawkins, T., and Debevec, P. 2003. Linear light source reflectometry. In ACM SIGGRAPH 2003 Papers, ACM, New York, NY, USA, SIGGRAPH ’03, 749–758.
    2. Ren, P., Wang, J., Snyder, J., Tong, X., and Guo, B. 2011. Pocket reflectometry. In ACM SIGGRAPH 2011 papers, ACM, New York, NY, USA, SIGGRAPH ’11, 45:1–45:10.

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