“Computer-aided coarse grid layout technique for photomasks” by Geer

A comprehensive computer-aided mask layout technique has been developed which permits quick conversion of LSI circuits into working photomasks. It is an efficient solution to the problem when the demand for customized circuit layouts greatly overshadows the more standardized techniques. No computer background or programming experience is required. This approach allows the designer to quickly compose high-density mask layouts using simple free-hand line symbols. These easily drawn symbols, representing complex circuitry, utilize a standard device-level building block library which simplifies the conversion of LSI circuits into photomasks, and permits the designer to generate up to 100% of the layout without leaving his desk.

1. Dr. A. E. Cosand, Private Communications, TRW/MEC High Speed Bipolar Department.Google Scholar
2. M. C. Van Lier and R. H. J. M. Ottem, “Automatic IC Layout: The Model and Technology”, IEEE Transactions on Circuits and Systems, Vol. CAS-22, No. 11, p. 845-854; November 1975.Google Scholar
3. Y. Nakada, K. Yoshida, S. Kawakami and M. Koike, “High Packing Density LSI Layout System with interactive Facilities”, IEEE ISSCC Digest of Technical Papers, p. 47-47 and p. 226-227; February 1974.Google ScholarCross Ref